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Information card for entry 7114112
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| Coordinates | 7114112.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H45 F12 N5 O2 P2 |
|---|---|
| Calculated formula | C32 H45 F12 N5 O2 P2 |
| Title of publication | Compartmental Schiff-base ligands as selective double-loaded extractants for copper(ii)Electronic supplementary information (ESI) available: synthetic and spectroscopic data. See http://www.rsc.org/suppdata/cc/b1/b109635b/ |
| Authors of publication | Black, Daniel; Blake, Alexander J.; Finn, Rachel L.; Lindoy, Leonard F.; Nezhadali, Azizollah; Rougnaghi, Gholamhossein; Tasker, Peter A.; Schröder, Martin |
| Journal of publication | Chemical Communications |
| Year of publication | 2002 |
| Journal issue | 4 |
| Pages of publication | 340 |
| a | 9.576 ± 0.003 Å |
| b | 10.916 ± 0.003 Å |
| c | 18.415 ± 0.004 Å |
| α | 89.67 ± 0.03° |
| β | 86.13 ± 0.03° |
| γ | 78.81 ± 0.02° |
| Cell volume | 1884 ± 0.9 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.122 |
| Residual factor for significantly intense reflections | 0.0861 |
| Weighted residual factors for all reflections | 0.249 |
| Weighted residual factors for significantly intense reflections | 0.206 |
| Goodness-of-fit parameter for all reflections | 1.023 |
| Goodness-of-fit parameter for significantly intense reflections | 1.053 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/7114112.html
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Users of the data should acknowledge the original authors of the
structural data.