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Information card for entry 7131244
Preview
| Coordinates | 7131244.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C50 H44 B N5 S Zn |
|---|---|
| Calculated formula | C50 H44 B N5 S Zn |
| SMILES | [Zn]123(Sc4[nH]c5c(c4)cccc5)[N](Cc4[n]1cccc4)(Cc1[n]2cccc1)Cc1[n]3cccc1.c1(ccccc1)[B-](c1ccccc1)(c1ccccc1)c1ccccc1 |
| Title of publication | Masking thiol reactivity with thioamide, thiourea, and thiocarbamate-based MBPs. |
| Authors of publication | Seo, Hyeonglim; Kohlbrand, Alysia J.; Stokes, Ryjul W.; Chung, Jeewon; Cohen, Seth M. |
| Journal of publication | Chemical communications (Cambridge, England) |
| Year of publication | 2023 |
| Journal volume | 59 |
| Journal issue | 16 |
| Pages of publication | 2283 - 2286 |
| a | 11.7128 ± 0.0007 Å |
| b | 9.8315 ± 0.0005 Å |
| c | 35.78 ± 0.002 Å |
| α | 90° |
| β | 95.106 ± 0.002° |
| γ | 90° |
| Cell volume | 4103.9 ± 0.4 Å3 |
| Cell temperature | 273.15 K |
| Ambient diffraction temperature | 273.15 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0574 |
| Residual factor for significantly intense reflections | 0.0368 |
| Weighted residual factors for significantly intense reflections | 0.0803 |
| Weighted residual factors for all reflections included in the refinement | 0.0874 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.028 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7131244.html
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Users of the data should acknowledge the original authors of the
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