Information card for entry 7204480
| Formula |
C14 H20 Cu F12 N2 O4 |
| Calculated formula |
C14 H20 Cu F12 N2 O4 |
| Title of publication |
Fluorinated aminoalkoxide CuII complexes: new CVD precursors for deposition of copper metal |
| Authors of publication |
Chi, Yun; Hsu, Peng-Fu; Liu, Chao-Shiuan; Ching, Wei-Li; Chou, Tsung-Yi; Carty, Arthur J.; Peng, Shie-Ming; Lee, Gene-Hsiang; Chuang, Shiow-Huey |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2002 |
| Journal volume |
12 |
| Journal issue |
12 |
| Pages of publication |
3541 |
| a |
11.0215 ± 0.0002 Å |
| b |
12.7768 ± 0.0002 Å |
| c |
13.2584 ± 0.0001 Å |
| α |
98.494 ± 0.001° |
| β |
102.203 ± 0.001° |
| γ |
114.022 ± 0.001° |
| Cell volume |
1608.65 ± 0.05 Å3 |
| Cell temperature |
295 ± 2 K |
| Ambient diffraction temperature |
295 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0614 |
| Residual factor for significantly intense reflections |
0.0435 |
| Weighted residual factors for all reflections |
0.1011 |
| Weighted residual factors for significantly intense reflections |
0.0932 |
| Goodness-of-fit parameter for all reflections |
1.013 |
| Goodness-of-fit parameter for significantly intense reflections |
1.034 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7204480.html
