Information card for entry 7204481
| Formula |
C16 H26 Cu F12 N2 O3 |
| Calculated formula |
C16 H26 Cu F12 N2 O3 |
| Title of publication |
Fluorinated aminoalkoxide CuII complexes: new CVD precursors for deposition of copper metal |
| Authors of publication |
Chi, Yun; Hsu, Peng-Fu; Liu, Chao-Shiuan; Ching, Wei-Li; Chou, Tsung-Yi; Carty, Arthur J.; Peng, Shie-Ming; Lee, Gene-Hsiang; Chuang, Shiow-Huey |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2002 |
| Journal volume |
12 |
| Journal issue |
12 |
| Pages of publication |
3541 |
| a |
9.9469 ± 0.0004 Å |
| b |
10.7389 ± 0.0004 Å |
| c |
12.824 ± 0.0005 Å |
| α |
65.919 ± 0.001° |
| β |
74.578 ± 0.001° |
| γ |
83.479 ± 0.001° |
| Cell volume |
1205.57 ± 0.08 Å3 |
| Cell temperature |
150 ± 1 K |
| Ambient diffraction temperature |
150 ± 1 K |
| Number of distinct elements |
6 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0513 |
| Residual factor for significantly intense reflections |
0.0291 |
| Weighted residual factors for significantly intense reflections |
0.0604 |
| Weighted residual factors for all reflections included in the refinement |
0.0637 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.006 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7204481.html
