Information card for entry 7208133
| Formula |
C22 H18 O2 |
| Calculated formula |
C22 H18 O2 |
| SMILES |
O=C1[C@H]2[C@@H]3c4ccccc4[C@H]([C@H]2C(=O)c2c1cccc2)C3=C(C)C |
| Title of publication |
Tetracene-based field-effect transistors using solution processes |
| Authors of publication |
Chien, Ching-Ting; Lin, Chih-Chun; Watanabe, Motonori; Lin, Yan-Duo; Chao, Ting-Han; Chiang, Ta-chung; Huang, Xin-Hua; Wen, Yuh-Sheng; Tu, Chih-Hsin; Sun, Chia-Hsing; Chow, Tahsin J. |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2012 |
| Journal volume |
22 |
| Journal issue |
26 |
| Pages of publication |
13070 |
| a |
14.3679 ± 0.001 Å |
| b |
12.3365 ± 0.0009 Å |
| c |
27.768 ± 0.002 Å |
| α |
90° |
| β |
101.536 ± 0.004° |
| γ |
90° |
| Cell volume |
4822.4 ± 0.6 Å3 |
| Cell temperature |
100 ± 0.1 K |
| Ambient diffraction temperature |
100 ± 0.1 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.1029 |
| Residual factor for significantly intense reflections |
0.0515 |
| Weighted residual factors for significantly intense reflections |
0.1173 |
| Weighted residual factors for all reflections included in the refinement |
0.1477 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.008 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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