Information card for entry 7208136
| Formula |
C19 H12 O |
| Calculated formula |
C19 H12 O |
| SMILES |
O=C1[C@H]2c3ccccc3[C@@H]1c1cc3ccccc3cc21 |
| Title of publication |
Tetracene-based field-effect transistors using solution processes |
| Authors of publication |
Chien, Ching-Ting; Lin, Chih-Chun; Watanabe, Motonori; Lin, Yan-Duo; Chao, Ting-Han; Chiang, Ta-chung; Huang, Xin-Hua; Wen, Yuh-Sheng; Tu, Chih-Hsin; Sun, Chia-Hsing; Chow, Tahsin J. |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2012 |
| Journal volume |
22 |
| Journal issue |
26 |
| Pages of publication |
13070 |
| a |
5.8708 ± 0.0002 Å |
| b |
7.6845 ± 0.0003 Å |
| c |
28.2976 ± 0.0009 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1276.62 ± 0.08 Å3 |
| Cell temperature |
200 ± 2 K |
| Ambient diffraction temperature |
200 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.0684 |
| Residual factor for significantly intense reflections |
0.0389 |
| Weighted residual factors for significantly intense reflections |
0.0824 |
| Weighted residual factors for all reflections included in the refinement |
0.108 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.026 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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