Information card for entry 7208135
| Formula |
C22 H18 |
| Calculated formula |
C22 H18 |
| SMILES |
c1cccc2[C@H]3c4cc5ccccc5cc4[C@@H](c12)C3=C(C)C |
| Title of publication |
Tetracene-based field-effect transistors using solution processes |
| Authors of publication |
Chien, Ching-Ting; Lin, Chih-Chun; Watanabe, Motonori; Lin, Yan-Duo; Chao, Ting-Han; Chiang, Ta-chung; Huang, Xin-Hua; Wen, Yuh-Sheng; Tu, Chih-Hsin; Sun, Chia-Hsing; Chow, Tahsin J. |
| Journal of publication |
Journal of Materials Chemistry |
| Year of publication |
2012 |
| Journal volume |
22 |
| Journal issue |
26 |
| Pages of publication |
13070 |
| a |
14.9138 ± 0.0013 Å |
| b |
15.253 ± 0.0012 Å |
| c |
15.136 ± 0.0014 Å |
| α |
90° |
| β |
118.815 ± 0.004° |
| γ |
90° |
| Cell volume |
3016.8 ± 0.5 Å3 |
| Cell temperature |
100 ± 0.1 K |
| Ambient diffraction temperature |
100 ± 0.1 K |
| Number of distinct elements |
2 |
| Space group number |
15 |
| Hermann-Mauguin space group symbol |
C 1 2/c 1 |
| Hall space group symbol |
-C 2yc |
| Residual factor for all reflections |
0.0839 |
| Residual factor for significantly intense reflections |
0.0609 |
| Weighted residual factors for significantly intense reflections |
0.1515 |
| Weighted residual factors for all reflections included in the refinement |
0.1648 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.066 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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