Information card for entry 7249965
| Formula |
C4 H8 N8 O6 |
| Calculated formula |
C4 H8 N8 O6 |
| Title of publication |
Ionization treatment of pyrazolo[4,3-c]pyrazole derivatives to achieve the low sensitivity of high-energy materials |
| Authors of publication |
Shi, Lei; Liu, Bangxiang; Wang, Pengfei; Gao, Chao; Zhang, Chong; Du, Yang; Sun, Chengguo; Hu, Bingcheng |
| Journal of publication |
CrystEngComm |
| Year of publication |
2025 |
| Journal volume |
27 |
| Journal issue |
13 |
| Pages of publication |
1918 - 1926 |
| a |
3.6899 ± 0.0007 Å |
| b |
13.747 ± 0.003 Å |
| c |
9.3323 ± 0.0013 Å |
| α |
90° |
| β |
95.909 ± 0.01° |
| γ |
90° |
| Cell volume |
470.87 ± 0.15 Å3 |
| Cell temperature |
233 K |
| Ambient diffraction temperature |
233 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0799 |
| Residual factor for significantly intense reflections |
0.0689 |
| Weighted residual factors for significantly intense reflections |
0.1864 |
| Weighted residual factors for all reflections included in the refinement |
0.1925 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.097 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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The link is:
https://www.crystallography.net/7249965.html
