Information card for entry 7249966
| Formula |
C4 H6 N6 O6 |
| Calculated formula |
C4 H6 N6 O6 |
| Title of publication |
Ionization treatment of pyrazolo[4,3-c]pyrazole derivatives to achieve the low sensitivity of high-energy materials |
| Authors of publication |
Shi, Lei; Liu, Bangxiang; Wang, Pengfei; Gao, Chao; Zhang, Chong; Du, Yang; Sun, Chengguo; Hu, Bingcheng |
| Journal of publication |
CrystEngComm |
| Year of publication |
2025 |
| Journal volume |
27 |
| Journal issue |
13 |
| Pages of publication |
1918 - 1926 |
| a |
3.4526 ± 0.0001 Å |
| b |
14.093 ± 0.0006 Å |
| c |
9.0501 ± 0.0004 Å |
| α |
90° |
| β |
94.007 ± 0.003° |
| γ |
90° |
| Cell volume |
439.28 ± 0.03 Å3 |
| Cell temperature |
223 K |
| Ambient diffraction temperature |
223 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0487 |
| Residual factor for significantly intense reflections |
0.044 |
| Weighted residual factors for significantly intense reflections |
0.1207 |
| Weighted residual factors for all reflections included in the refinement |
0.1254 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.102 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7249966.html