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Information card for entry 8000049
Preview
| Coordinates | 8000049.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C27 H36 N2 O2 Si W |
|---|---|
| Calculated formula | C27 H36 N2 O2 Si W |
| SMILES | [W]1234(C#[O])(C#[O])([Si](C)(C)[n+]5ccc(cc5)N(C)C)(c5ccccc5)[c]5([c]4([c]3([c]2([c]15C)C)C)C)C |
| Title of publication | Reversible 1,2-Migration of Aryl Groups on Silyl Ligands: Formation and Properties of Silylenetungsten Complexes Stabilized by an External Base |
| Authors of publication | Eiji Suzuki; Masaaki Okazaki; Hiromi Tobita |
| Journal of publication | Chemistry Letters |
| Year of publication | 2005 |
| Journal volume | 34 |
| Journal issue | 7 |
| Pages of publication | 1026 |
| a | 9.3757 ± 0.0005 Å |
| b | 14.2704 ± 0.0012 Å |
| c | 21.028 ± 0.001 Å |
| α | 84.401 ± 0.002° |
| β | 79.749 ± 0.004° |
| γ | 72.982 ± 0.003° |
| Cell volume | 2644.2 ± 0.3 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1278 |
| Residual factor for significantly intense reflections | 0.1034 |
| Weighted residual factors for significantly intense reflections | 0.2395 |
| Weighted residual factors for all reflections included in the refinement | 0.2528 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.14 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71069 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/8000049.html
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Users of the data should acknowledge the original authors of the
structural data.