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Information card for entry 8000050
Preview
| Coordinates | 8000050.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C28 H38 N2 O2 Si W |
|---|---|
| Calculated formula | C28 H38 N2 O2 Si W |
| SMILES | [W]1234([Si](C)(C)c5ccc(cc5)C)([n]5ccc(N(C)C)cc5)(C#[O])(C#[O])[c]5([c]4([c]3([c]2([c]15C)C)C)C)C |
| Title of publication | Reversible 1,2-Migration of Aryl Groups on Silyl Ligands: Formation and Properties of Silylenetungsten Complexes Stabilized by an External Base |
| Authors of publication | Eiji Suzuki; Masaaki Okazaki; Hiromi Tobita |
| Journal of publication | Chemistry Letters |
| Year of publication | 2005 |
| Journal volume | 34 |
| Journal issue | 7 |
| Pages of publication | 1026 |
| a | 9.187 ± 0.0002 Å |
| b | 9.7027 ± 0.0001 Å |
| c | 16.6719 ± 0.0005 Å |
| α | 93.026 ± 0.003° |
| β | 93.875 ± 0.002° |
| γ | 113.821 ± 0.003° |
| Cell volume | 1351.17 ± 0.05 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.059 |
| Residual factor for significantly intense reflections | 0.0571 |
| Weighted residual factors for significantly intense reflections | 0.1528 |
| Weighted residual factors for all reflections included in the refinement | 0.1534 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.378 |
| Diffraction radiation wavelength | 0.71069 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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