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Information card for entry 1551149
Preview
| Coordinates | 1551149.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C39 H64 N2 P4 Si5 |
|---|---|
| Calculated formula | C39 H64 N2 P4 Si5 |
| SMILES | P1(P2P3P2[Si]13C=C1N(C(=C(N1c1c(cccc1C(C)C)C(C)C)C)C)c1c(cccc1C(C)C)C(C)C)[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C |
| Title of publication | A Vinyl Silylsilylene and its Activation of Strong Homo- and Heteroatomic Bonds |
| Authors of publication | Roy, Matthew M. D.; Ferguson, Michael J.; McDonald, Robert; Zhou, Yuqiao; Rivard, Eric |
| Journal of publication | Chemical Science |
| Year of publication | 2019 |
| a | 10.1314 ± 0.0004 Å |
| b | 13.5879 ± 0.0006 Å |
| c | 18.6001 ± 0.0007 Å |
| α | 78.391 ± 0.003° |
| β | 85.188 ± 0.002° |
| γ | 77.406 ± 0.003° |
| Cell volume | 2445.7 ± 0.18 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.072 |
| Residual factor for significantly intense reflections | 0.0603 |
| Weighted residual factors for significantly intense reflections | 0.1709 |
| Weighted residual factors for all reflections included in the refinement | 0.1837 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.035 |
| Diffraction radiation wavelength | 1.54178 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1551149.html
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Users of the data should acknowledge the original authors of the
structural data.