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Information card for entry 1552314
Preview
| Coordinates | 1552314.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | 1,1,3,3-Tetramethyldisila-2-oxa[3]nickelocenophane |
|---|---|
| Formula | C14 H20 Ni O Si2 |
| Calculated formula | C14 H20 Ni O Si2 |
| SMILES | [Ni]123456789[c]%10([cH]4[cH]3[cH]2[cH]1%10)[Si](O[Si]([c]15[cH]6[cH]7[cH]8[cH]91)(C)C)(C)C |
| Title of publication | Role of torsional strain in the ring-opening polymerisation of low strain [n]nickelocenophanes |
| Authors of publication | Musgrave, Rebecca A.; Hailes, Rebekah L. N.; Annibale, Vincent T.; Manners, Ian |
| Journal of publication | Chemical Science |
| Year of publication | 2019 |
| a | 8.3913 ± 0.0002 Å |
| b | 11.3601 ± 0.0003 Å |
| c | 15.8756 ± 0.0004 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 1513.36 ± 0.07 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 19 |
| Hermann-Mauguin space group symbol | P 21 21 21 |
| Hall space group symbol | P 2ac 2ab |
| Residual factor for all reflections | 0.0258 |
| Residual factor for significantly intense reflections | 0.0227 |
| Weighted residual factors for significantly intense reflections | 0.0507 |
| Weighted residual factors for all reflections included in the refinement | 0.0519 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.015 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/1552314.html
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