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Information card for entry 1556168
Preview
Coordinates | 1556168.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C21 H30 N2 O Si |
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Calculated formula | C21 H30 N2 O Si |
SMILES | N1=NC[C@@H]2C[C@@H]3CCCCC(=C\c4ccccc4)/[C@]3([C@H]12)O[Si](C)(C)C.N1=NC[C@H]2C[C@H]3CCCCC(=C\c4ccccc4)/[C@@]3([C@@H]12)O[Si](C)(C)C |
Title of publication | Sequential reactions of trimethylsilyldiazomethane with 4-alkenyl ketones and aldehydes catalyzed by Lewis bases. |
Authors of publication | Liu, Huaqing; O'Connor, Matthew J; Sun, Chunrui; Wink, Donald J.; Lee, Daesung |
Journal of publication | Organic letters |
Year of publication | 2013 |
Journal volume | 15 |
Journal issue | 12 |
Pages of publication | 2974 - 2977 |
a | 8.4425 ± 0.0008 Å |
b | 13.9418 ± 0.0013 Å |
c | 17.4523 ± 0.0016 Å |
α | 90° |
β | 91.014 ± 0.002° |
γ | 90° |
Cell volume | 2053.9 ± 0.3 Å3 |
Cell temperature | 298 ± 2 K |
Ambient diffraction temperature | 298 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.081 |
Residual factor for significantly intense reflections | 0.0549 |
Weighted residual factors for significantly intense reflections | 0.1238 |
Weighted residual factors for all reflections included in the refinement | 0.1353 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.003 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/1556168.html
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