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Information card for entry 2001514
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Coordinates | 2001514.cif |
---|---|
Original IUCr paper | HTML |
External links | ChemSpider |
Chemical name | Bis((trimethylsiloxy)bis(trimethylsilylmethyl)indium) |
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Formula | C22 H62 In2 O2 Si6 |
Calculated formula | C22 H62 In2 O2 Si6 |
SMILES | [In](O[Si](C)(C)C)(C[Si](C)(C)C)C[Si](C)(C)C |
Title of publication | Structure of bis-μ-[(trimethylsilylmethanolato-<i>O</i>)-bis(trimethylsilylmethyl)gallium] and bis-μ-[(trimethylsilylmethanolato-<i>O</i>)-bis(trimethylsilylmethyl)indium] |
Authors of publication | Dembowski, U.; Pape, T.; Herbst-Irmer, R.; Pohl, E.; Roesky, H. W.; Sheldrick, G. M. |
Journal of publication | Acta Crystallographica Section C |
Year of publication | 1993 |
Journal volume | 49 |
Journal issue | 7 |
Pages of publication | 1309 - 1311 |
a | 9.887 ± 0.004 Å |
b | 11.879 ± 0.004 Å |
c | 17.586 ± 0.006 Å |
α | 104.4 ± 0.02° |
β | 93.43 ± 0.03° |
γ | 94.66 ± 0.02° |
Cell volume | 1987.1 ± 1.3 Å3 |
Cell temperature | 153 ± 1 K |
Ambient diffraction temperature | 153 ± 1 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0356 |
Residual factor for significantly intense reflections | 0.026 |
Weighted residual factors for all reflections | 0.0627 |
Weighted residual factors for significantly intense reflections | 0.0543 |
Goodness-of-fit parameter for all reflections | 1.069 |
Goodness-of-fit parameter for significantly intense reflections | 1.049 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/2001514.html
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Users of the data should acknowledge the original authors of the
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