Information card for entry 4000758
| Chemical name |
(2,2,6,6-tetramethylheptane-3,5-dionato)silver(i)-triethylphosphine |
| Formula |
C34 H68 Ag2 O4 P2 |
| Calculated formula |
C34 H68 Ag2 O4 P2 |
| SMILES |
[Ag]1([P](CC)(CC)CC)[O]=C(C=C(O1)C(C)(C)C)C(C)(C)C |
| Title of publication |
Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films |
| Authors of publication |
Kariniemi, Maarit; Niinistö, Jaakko; Hatanpää, Timo; Kemell, Marianna; Sajavaara, Timo; Ritala, Mikko; Leskelä, Markku |
| Journal of publication |
Chemistry of Materials |
| Year of publication |
2011 |
| Journal volume |
23 |
| Journal issue |
11 |
| Pages of publication |
2901 |
| a |
11.004 ± 0.002 Å |
| b |
13.139 ± 0.003 Å |
| c |
15.31 ± 0.003 Å |
| α |
81.67 ± 0.03° |
| β |
87.02 ± 0.03° |
| γ |
69.85 ± 0.03° |
| Cell volume |
2056.1 ± 0.8 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0441 |
| Residual factor for significantly intense reflections |
0.0279 |
| Weighted residual factors for significantly intense reflections |
0.0555 |
| Weighted residual factors for all reflections included in the refinement |
0.0606 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.987 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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