Crystallography Open Database
- COD Home
- Accessing COD Data
- Add Your Data
- Documentation
Information card for entry 4001706
Preview
Coordinates | 4001706.cif |
---|---|
Original paper (by DOI) | HTML |
Chemical name | (1,2-bis(butylselanyl)ethane)tetrachlorotin(IV) |
---|---|
Formula | C10 H22 Cl4 Se2 Sn |
Calculated formula | C10 H22 Cl4 Se2 Sn |
SMILES | CCCC[Se]1CC[Se]([Sn]1(Cl)(Cl)(Cl)Cl)CCCC |
Title of publication | Highly Selective Chemical Vapor Deposition of Tin Diselenide Thin Films onto Patterned Substrates via Single Source Diselenoether Precursors |
Authors of publication | de Groot, C. H. (Kees); Gurnani, Chitra; Hector, Andrew L.; Huang, Ruomeng; Jura, Marek; Levason, William; Reid, Gillian |
Journal of publication | Chemistry of Materials |
Year of publication | 2012 |
Journal volume | 24 |
Journal issue | 22 |
Pages of publication | 4442 |
a | 9.186 ± 0.002 Å |
b | 11.811 ± 0.004 Å |
c | 17.1785 ± 0.001 Å |
α | 90° |
β | 102.432 ± 0.004° |
γ | 90° |
Cell volume | 1820.1 ± 0.7 Å3 |
Cell temperature | 120 ± 2 K |
Ambient diffraction temperature | 120 ± 2 K |
Number of distinct elements | 5 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0402 |
Residual factor for significantly intense reflections | 0.0336 |
Weighted residual factors for significantly intense reflections | 0.0753 |
Weighted residual factors for all reflections included in the refinement | 0.0794 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.074 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4001706.html
All data in the COD and the database itself are dedicated to the
public domain and licensed under the
CC0
License
.
Users of the data should acknowledge the original authors of the
structural data.