Information card for entry 4031715
| Formula |
C22 H22 S7 Si2 |
| Calculated formula |
C22 H22 S7 Si2 |
| SMILES |
s1c2scc(Sc3c4c5cc(sc5sc4sc3)[Si](C)(C)C)c2c2c1sc([Si](C)(C)C)c2 |
| Title of publication |
Silicon Spiro Double Helicene-like Compounds Based on Dithieno[2,3-b:3',2'-d]thiophene: Syntheses and Crystal Structures. |
| Authors of publication |
Li, Chunli; Wu, Longlong; Xu, Wan; Song, Jinsheng; Shi, Jianwu; Yu, Panpan; Kan, Yuhe; Wang, Hua |
| Journal of publication |
The Journal of organic chemistry |
| Year of publication |
2015 |
| Journal volume |
80 |
| Journal issue |
21 |
| Pages of publication |
11156 - 11161 |
| a |
12.846 ± 0.005 Å |
| b |
10.521 ± 0.004 Å |
| c |
20.355 ± 0.007 Å |
| α |
90° |
| β |
103.438 ± 0.006° |
| γ |
90° |
| Cell volume |
2675.7 ± 1.7 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/c 1 |
| Hall space group symbol |
-P 2ybc |
| Residual factor for all reflections |
0.0516 |
| Residual factor for significantly intense reflections |
0.0371 |
| Weighted residual factors for significantly intense reflections |
0.108 |
| Weighted residual factors for all reflections included in the refinement |
0.124 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.822 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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