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Information card for entry 4065859
Preview
Coordinates | 4065859.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C70 H84 N4 O2 Si2 |
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Calculated formula | C70 H84 N4 O2 Si2 |
SMILES | C1(c2ccccc2)=[N]([Si]23(N1C(C)(C)C)(O[Si]13([N](=C(c3ccccc3)N1C(C)(C)C)C(C)(C)C)(O2)C(c1ccccc1)c1ccccc1)C(c1ccccc1)c1ccccc1)C(C)(C)C.c1(ccccc1)C.c1(ccccc1)C |
Title of publication | Synthesis of a Stable Four-Membered Si2O2Ring and a Dimer with Two Four-Membered Si2O2Rings Bridged by Two Oxygen Atoms, with Five-Coordinate Silicon Atoms in Both Ring Systems |
Authors of publication | Sen, Sakya S.; Tavčar, Gašper; Roesky, Herbert W.; Kratzert, Daniel; Hey, Jakob; Stalke, Dietmar |
Journal of publication | Organometallics |
Year of publication | 2010 |
Journal volume | 29 |
Journal issue | 10 |
Pages of publication | 2343 |
a | 12.484 ± 0.0017 Å |
b | 11.4379 ± 0.0016 Å |
c | 21.383 ± 0.003 Å |
α | 90° |
β | 100.954 ± 0.003° |
γ | 90° |
Cell volume | 2997.7 ± 0.7 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/n 1 |
Hall space group symbol | -P 2yn |
Residual factor for all reflections | 0.0569 |
Residual factor for significantly intense reflections | 0.0405 |
Weighted residual factors for significantly intense reflections | 0.0918 |
Weighted residual factors for all reflections included in the refinement | 0.0999 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.021 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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Users of the data should acknowledge the original authors of the
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