Information card for entry 4066487

Structure parameters

• Common name: Alkyl Amide Imide Tantalum
• Formula: C19 H49 N2 Si3 Ta
• Calculated formula: C19 H49 N2 Si3 Ta
• SMILES: [Ta](N([Si](C)(C)C)[Si](C)(C)C)(=N[Si](C)(C)C)(CC(C)(C)C)CC(C)(C)C
• Title of publication: Preparation of the Alkyl Complex Ta(═NSiMe3)[N(SiMe3)2](CH2But)2. Preferential Oxygen Insertion in Its Reaction with O2and a Ligand Exchange in the Alkoxide Ta(═NSiMe3)[N(SiMe3)2](OCH2But)2†
• Authors of publication: Chen, Shu-Jian; Xue, Zi-Ling
• Journal of publication: Organometallics
• Year of publication: 2010
• Journal volume: 29
• Journal issue: 21
• Pages of publication: 5579
• a: 11.58 ± 0.014 Å
• b: 11.882 ± 0.014 Å
• c: 20.84 ± 0.02 Å
• α: 90.005 ± 0.014°
• β: 90.129 ± 0.014°
• γ: 94.043 ± 0.015°
• Cell volume: 2860 ± 6 ų
• Cell temperature: 173 ± 2 K
• Ambient diffraction temperature: 173 ± 2 K
• Number of distinct elements: 5
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0725
• Residual factor for significantly intense reflections: 0.0483
• Weighted residual factors for significantly intense reflections: 0.1345
• Weighted residual factors for all reflections included in the refinement: 0.1673
• Goodness-of-fit parameter for all reflections included in the refinement: 1.125
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No