Information card for entry 4066703

Structure parameters

• Formula: C29 H33 Cl N2 O2 Si
• Calculated formula: C29 H33 Cl N2 O2 Si
• SMILES: Cl[Si]12([N](=C(N1C(C)(C)C)c1ccccc1)C(C)(C)C)OC(=C(O2)c1ccccc1)c1ccccc1
• Title of publication: Reactions of a Bis-silylene (LSi−SiL, L = PhC(NtBu)2) and a Heteroleptic Chloro Silylene (LSiCl) with Benzil: Formation of Bis(siladioxolene) and Monosiladioxolene Analogue with Five-Coordinate Silicon Atoms in Both Ring Systems
• Authors of publication: Tavčar, Gašper; Sen, Sakya S.; Roesky, Herbert W.; Hey, Jakob; Kratzert, Daniel; Stalke, Dietmar
• Journal of publication: Organometallics
• Year of publication: 2010
• Journal volume: 29
• Journal issue: 17
• Pages of publication: 3930
• a: 12.2971 ± 0.0004 Å
• b: 18.4375 ± 0.0006 Å
• c: 11.5359 ± 0.0003 Å
• α: 90°
• β: 95.673 ± 0.002°
• γ: 90°
• Cell volume: 2602.7 ± 0.14 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.0556
• Residual factor for significantly intense reflections: 0.0392
• Weighted residual factors for significantly intense reflections: 0.0917
• Weighted residual factors for all reflections included in the refinement: 0.1
• Goodness-of-fit parameter for all reflections included in the refinement: 1.06
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No