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Information card for entry 4068721
Preview
| Coordinates | 4068721.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C23 H52 Cl3 F6 N2 Os P3 |
|---|---|
| Calculated formula | C23 H52 Cl3 F6 N2 Os P3 |
| SMILES | [OsH2]([P](C(C)C)(C(C)C)C(C)C)([P](C(C)C)(C(C)C)C(C)C)(Cl)([N]#CC)[N]#CC.[P](F)(F)(F)(F)(F)[F-].C(Cl)Cl |
| Title of publication | Behavior of OsH2Cl2(PiPr3)2in Acetonitrile: The Importance of the Small Details |
| Authors of publication | Esteruelas, Miguel A.; Fuertes, Sara; Oliván, Montserrat; Oñate, Enrique |
| Journal of publication | Organometallics |
| Year of publication | 2009 |
| Journal volume | 28 |
| Journal issue | 5 |
| Pages of publication | 1582 |
| a | 12.007 ± 0.003 Å |
| b | 12.305 ± 0.003 Å |
| c | 12.584 ± 0.003 Å |
| α | 96.562 ± 0.004° |
| β | 96.045 ± 0.004° |
| γ | 111.462 ± 0.003° |
| Cell volume | 1697.1 ± 0.7 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0275 |
| Residual factor for significantly intense reflections | 0.0251 |
| Weighted residual factors for significantly intense reflections | 0.0593 |
| Weighted residual factors for all reflections included in the refinement | 0.0601 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.031 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4068721.html
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Users of the data should acknowledge the original authors of the
structural data.