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Information card for entry 4070386
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Coordinates | 4070386.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | Hafnium |
---|---|
Chemical name | Hafnium Amdie Cylic O complex with cis configuration |
Formula | C28 H82 Hf2 N6 O2 Si8 |
Calculated formula | C28 H82 Hf2 N6 O2 Si8 |
SMILES | C1[O]2[Hf](N([Si]1(C)C)[Si](C)(C)C)(N([Si](C)(C)C)[Si](C)(C)C)(N(C)C)[O]1C[Si](C)(C)N([Hf]21(N([Si](C)(C)C)[Si](C)(C)C)N(C)C)[Si](C)(C)C |
Title of publication | Reactions of Oxygen with Metallaheterocyclic Alkyl Amide Complexes. Selective Insertion of Oxygen into Metal−Carbon Bonds |
Authors of publication | Yu, Xianghua; Chen, Xue-Tai; Xue, Zi-Ling |
Journal of publication | Organometallics |
Year of publication | 2009 |
Journal volume | 28 |
Journal issue | 23 |
Pages of publication | 6642 |
a | 14.304 ± 0.005 Å |
b | 18.843 ± 0.006 Å |
c | 18.479 ± 0.006 Å |
α | 90° |
β | 91.258 ± 0.005° |
γ | 90° |
Cell volume | 4979 ± 3 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.055 |
Residual factor for significantly intense reflections | 0.0405 |
Weighted residual factors for significantly intense reflections | 0.1061 |
Weighted residual factors for all reflections included in the refinement | 0.1339 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.909 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4070386.html
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