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Information card for entry 4070786
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Jmol._Canvas2D (Jmol) "jmolApplet0"[x]
Coordinates | 4070786.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C23 H52 O Si6 |
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Calculated formula | C23 H56 O Si6 |
SMILES | [Si]([C@@H]1/C(=C\C([Si](C)(C)C)[Si](C)(C)C)[Si@](OC)([C@H]([Si](C)(C)C)[C@H]1[Si](C)(C)C)C)(C)(C)C.[Si]([C@H]1/C(=C\C([Si](C)(C)C)[Si](C)(C)C)[Si@@](OC)([C@@H]([Si](C)(C)C)[C@@H]1[Si](C)(C)C)C)(C)(C)C |
Title of publication | An Unexpected Ring Contraction: Phenylsilane to Silacyclopentane |
Authors of publication | Lim, Young Mook; Lee, Myong Euy |
Journal of publication | Organometallics |
Year of publication | 2008 |
Journal volume | 27 |
Journal issue | 5 |
Pages of publication | 1000 |
a | 9.5333 ± 0.0015 Å |
b | 13.396 ± 0.002 Å |
c | 14.371 ± 0.002 Å |
α | 82.678 ± 0.003° |
β | 81.324 ± 0.003° |
γ | 70.564 ± 0.002° |
Cell volume | 1705 ± 0.4 Å3 |
Cell temperature | 293 ± 2 K |
Ambient diffraction temperature | 293 ± 2 K |
Number of distinct elements | 4 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1166 |
Residual factor for significantly intense reflections | 0.0596 |
Weighted residual factors for significantly intense reflections | 0.1127 |
Weighted residual factors for all reflections included in the refinement | 0.1289 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.969 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4070786.html
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Users of the data should acknowledge the original authors of the
structural data.