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Information card for entry 4070832
Preview
Coordinates | 4070832.cif |
---|---|
Original paper (by DOI) | HTML |
Common name | compound 3 |
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Formula | C36 H73 Li O2 Si7 |
Calculated formula | C36 H73 Li O2 Si7 |
SMILES | [Si]12([CH]3=[CH]4C5[CH]6=[CH]1[Li]13456[O](C)CC[O]1C)c1c(cc(cc1C2([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)[Si](C)(C)C)C([Si](C)(C)C)[Si](C)(C)C |
Title of publication | Reduction of a Kinetically Stabilized Silabenzene Leading to the Formation of the Corresponding Anion Radical Species† |
Authors of publication | Matsumoto, Takeshi; Sasamori, Takahiro; Sato, Kazunobu; Takui, Takeji; Tokitoh, Norihiro |
Journal of publication | Organometallics |
Year of publication | 2008 |
Journal volume | 27 |
Journal issue | 3 |
Pages of publication | 305 |
a | 13.5762 ± 0.0001 Å |
b | 17.8032 ± 0.0002 Å |
c | 21.6131 ± 0.0002 Å |
α | 101.868 ± 0.0005° |
β | 98.5113 ± 0.0005° |
γ | 108.785 ± 0.0008° |
Cell volume | 4708.73 ± 0.08 Å3 |
Cell temperature | 103 ± 2 K |
Ambient diffraction temperature | 103 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0378 |
Residual factor for significantly intense reflections | 0.0322 |
Weighted residual factors for significantly intense reflections | 0.0843 |
Weighted residual factors for all reflections included in the refinement | 0.0877 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.019 |
Diffraction radiation wavelength | 0.71069 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4070832.html
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Users of the data should acknowledge the original authors of the
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