Information card for entry 4071541

Structure parameters

• Formula: C28 H46 Cl2 N P2 Rh Si
• Calculated formula: C28 H46 Cl2 N P2 Rh Si
• SMILES: [Rh]12([Si](Cl)(C)C)([P](c3cc(ccc3N2c2ccc(cc2[P]1(C(C)C)C(C)C)C)C)(C(C)C)C(C)C)Cl
• Title of publication: Oxidative Addition Reactions of Silyl Halides with the (PNP)Rh Fragment
• Authors of publication: Gatard, Sylvain; Chen, Chun-Hsing; Foxman, Bruce M.; Ozerov, Oleg V.
• Journal of publication: Organometallics
• Year of publication: 2008
• Journal volume: 27
• Journal issue: 23
• Pages of publication: 6257
• a: 14.0161 ± 0.0008 Å
• b: 13.1551 ± 0.0007 Å
• c: 17.3099 ± 0.001 Å
• α: 90°
• β: 100.205 ± 0.003°
• γ: 90°
• Cell volume: 3141.2 ± 0.3 ų
• Cell temperature: 120 K
• Ambient diffraction temperature: 120 K
• Number of distinct elements: 7
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0551
• Residual factor for significantly intense reflections: 0.0375
• Weighted residual factors for all reflections: 0.112
• Weighted residual factors for significantly intense reflections: 0.0929
• Weighted residual factors for all reflections included in the refinement: 0.112
• Goodness-of-fit parameter for all reflections included in the refinement: 0.9152
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No