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Information card for entry 4072262
Preview
Coordinates | 4072262.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C23 H32 P2 Si V |
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Calculated formula | C23 H32 P2 Si V |
SMILES | [V]12345([P](CC[P]1(C)C)(C)C)([SiH](c1ccccc1)c1ccccc1)[cH]1[cH]2[cH]3[cH]5[cH]41 |
Title of publication | Paramagnetic Vanadium Silyl Complexes: Synthesis, Structure, and Reactivity |
Authors of publication | Shinohara, Akihiro; McBee, Jennifer; Waterman, Rory; Tilley, T. Don |
Journal of publication | Organometallics |
Year of publication | 2008 |
Journal volume | 27 |
Journal issue | 21 |
Pages of publication | 5717 |
a | 10.1297 ± 0.0011 Å |
b | 8.8751 ± 0.001 Å |
c | 26.927 ± 0.003 Å |
α | 90° |
β | 100.262 ± 0.002° |
γ | 90° |
Cell volume | 2382.1 ± 0.5 Å3 |
Cell temperature | 147 ± 2 K |
Ambient diffraction temperature | 147 ± 2 K |
Number of distinct elements | 5 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0647 |
Residual factor for significantly intense reflections | 0.0427 |
Weighted residual factors for significantly intense reflections | 0.0784 |
Weighted residual factors for all reflections included in the refinement | 0.0848 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.931 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4072262.html
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