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Information card for entry 4072264
Preview
| Coordinates | 4072264.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C29 H37 Cl2 P2 Si V |
|---|---|
| Calculated formula | C29 H37 Cl2 P2 Si V |
| SMILES | [V]12345([cH]6[cH]3[cH]5[cH]2[cH]46)([Si](c2ccccc2)(Cl)c2ccccc2)([P](C)(CC[P]1(C)C)C)Cl.c1ccccc1 |
| Title of publication | Paramagnetic Vanadium Silyl Complexes: Synthesis, Structure, and Reactivity |
| Authors of publication | Shinohara, Akihiro; McBee, Jennifer; Waterman, Rory; Tilley, T. Don |
| Journal of publication | Organometallics |
| Year of publication | 2008 |
| Journal volume | 27 |
| Journal issue | 21 |
| Pages of publication | 5717 |
| a | 17.424 ± 0.0013 Å |
| b | 9.493 ± 0.0007 Å |
| c | 17.8481 ± 0.0014 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2952.2 ± 0.4 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 33 |
| Hermann-Mauguin space group symbol | P n a 21 |
| Hall space group symbol | P 2c -2n |
| Residual factor for all reflections | 0.0603 |
| Residual factor for significantly intense reflections | 0.0335 |
| Weighted residual factors for significantly intense reflections | 0.0543 |
| Weighted residual factors for all reflections included in the refinement | 0.0564 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.632 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4072264.html
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