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Information card for entry 4072579
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Coordinates | 4072579.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C70 H94 Cl2 O33 Os6 Si8 |
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Calculated formula | C70 H92 Cl2 O33 Os6 Si8 |
SMILES | C1(CCCCC1)[Si@@]1([O]2[Os]3(C#[O])(C#[O])(C#[O])[Os]2([Os]3(C#[O])(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O])O[Si]2(C3CCCCC3)O[Si]3(O[Si@](O1)(O[Si@@]1(O[Si](O2)(O[Si](C2CCCCC2)(O[Si@@](C2CCCCC2)([O]2[Os]4(C#[O])(C#[O])(C#[O])[Os]2(C#[O])(C#[O])(C#[O])[Os]4(C#[O])(C#[O])(C#[O])C#[O])O1)O3)C1CCCCC1)C1CCCCC1)C1CCCCC1)C1CCCCC1.C(Cl)CCl.C1(CCCCC1)[Si@]1([O]2[Os]3(C#[O])(C#[O])(C#[O])[Os]2([Os]3(C#[O])(C#[O])(C#[O])C#[O])(C#[O])(C#[O])C#[O])O[Si]2(C3CCCCC3)O[Si]3(O[Si@@](O1)(O[Si@]1(O[Si](O2)(O[Si](C2CCCCC2)(O[Si@](C2CCCCC2)([O]2[Os]4(C#[O])(C#[O])(C#[O])[Os]2(C#[O])(C#[O])(C#[O])[Os]4(C#[O])(C#[O])(C#[O])C#[O])O1)O3)C1CCCCC1)C1CCCCC1)C1CCCCC1)C1CCCCC1.C(Cl)CCl |
Title of publication | Synthesis and Characterization of Osmium-Containing Silsesquioxanes: High-Yield Routes to {Os3(CO)10(μ-H)[(μ-O)Si7O10(c-C6H11)7]} and the New Clusters {Os3(CO)10(μ-H)[(μ-O)Si7O9(OH)2(c-C6H11)7]}, {[Os3(CO)10(μ-H)]2(μ-O)2Si7O9(OH)(c-C6H11)7}, {Os3(CO)10(μ-H)[(μ-O)Si8O11(OH)(c-C6H11)8]}, and {[Os3(CO)10(μ-H)]2(μ-O)2Si8O11(c-C6H11)8} |
Authors of publication | Lucenti, Elena; Feher, Frank J.; Ziller, Joseph W. |
Journal of publication | Organometallics |
Year of publication | 2007 |
Journal volume | 26 |
Journal issue | 1 |
Pages of publication | 75 |
a | 29.3568 ± 0.0018 Å |
b | 13.3023 ± 0.0008 Å |
c | 24.833 ± 0.0016 Å |
α | 90° |
β | 106.381 ± 0.001° |
γ | 90° |
Cell volume | 9304 ± 1 Å3 |
Cell temperature | 158 ± 2 K |
Ambient diffraction temperature | 158 ± 2 K |
Number of distinct elements | 6 |
Space group number | 15 |
Hermann-Mauguin space group symbol | C 1 2/c 1 |
Hall space group symbol | -C 2yc |
Residual factor for all reflections | 0.0907 |
Residual factor for significantly intense reflections | 0.045 |
Weighted residual factors for significantly intense reflections | 0.0876 |
Weighted residual factors for all reflections included in the refinement | 0.1019 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.041 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4072579.html
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