Information card for entry 4073999
| Formula |
C18 H22 O3 Si |
| Calculated formula |
C18 H22 O3 Si |
| SMILES |
[Si](c1c(OC)cc(OC)cc1OC)(C=C)(C)c1ccccc1 |
| Title of publication |
The 2,4,6-Trimethoxyphenyl Unit as a Unique Protecting Group for Silicon in Synthesis and the Silylation Potential of (2,4,6-Trimethoxyphenyl)silanes |
| Authors of publication |
Popp, Friedrich; Nätscher, Jennifer B.; Daiss, Jürgen O.; Burschka, Christian; Tacke, Reinhold |
| Journal of publication |
Organometallics |
| Year of publication |
2007 |
| Journal volume |
26 |
| Journal issue |
24 |
| Pages of publication |
6014 |
| a |
8.5471 ± 0.001 Å |
| b |
9.8544 ± 0.0011 Å |
| c |
11.1205 ± 0.0012 Å |
| α |
77.363 ± 0.012° |
| β |
72.171 ± 0.012° |
| γ |
80.161 ± 0.013° |
| Cell volume |
864.6 ± 0.18 Å3 |
| Cell temperature |
193 ± 2 K |
| Ambient diffraction temperature |
193 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0428 |
| Residual factor for significantly intense reflections |
0.0357 |
| Weighted residual factors for significantly intense reflections |
0.096 |
| Weighted residual factors for all reflections included in the refinement |
0.0994 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.068 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
For the version history of this entry, please navigate to main COD server.
The link is:
https://www.crystallography.net/4073999.html
