Information card for entry 4074000
| Formula |
C19 H24 O3 Si |
| Calculated formula |
C19 H24 O3 Si |
| SMILES |
[Si](C)(CC=C)(c1ccccc1)c1c(OC)cc(OC)cc1OC |
| Title of publication |
The 2,4,6-Trimethoxyphenyl Unit as a Unique Protecting Group for Silicon in Synthesis and the Silylation Potential of (2,4,6-Trimethoxyphenyl)silanes |
| Authors of publication |
Popp, Friedrich; Nätscher, Jennifer B.; Daiss, Jürgen O.; Burschka, Christian; Tacke, Reinhold |
| Journal of publication |
Organometallics |
| Year of publication |
2007 |
| Journal volume |
26 |
| Journal issue |
24 |
| Pages of publication |
6014 |
| a |
8.299 ± 0.0017 Å |
| b |
14.67 ± 0.003 Å |
| c |
15.057 ± 0.003 Å |
| α |
86.34 ± 0.03° |
| β |
85.94 ± 0.03° |
| γ |
81.1 ± 0.03° |
| Cell volume |
1803.9 ± 0.7 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0731 |
| Residual factor for significantly intense reflections |
0.0448 |
| Weighted residual factors for significantly intense reflections |
0.113 |
| Weighted residual factors for all reflections included in the refinement |
0.1238 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.006 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4074000.html
