Information card for entry 4074004
| Formula |
C21 H21 Cl O3 Si |
| Calculated formula |
C21 H21 Cl O3 Si |
| SMILES |
c1(ccccc1)[Si](c1c(cccc1OC)OC)(c1ccc(cc1)OC)Cl |
| Title of publication |
The 2,4,6-Trimethoxyphenyl Unit as a Unique Protecting Group for Silicon in Synthesis and the Silylation Potential of (2,4,6-Trimethoxyphenyl)silanes |
| Authors of publication |
Popp, Friedrich; Nätscher, Jennifer B.; Daiss, Jürgen O.; Burschka, Christian; Tacke, Reinhold |
| Journal of publication |
Organometallics |
| Year of publication |
2007 |
| Journal volume |
26 |
| Journal issue |
24 |
| Pages of publication |
6014 |
| a |
9.231 ± 0.0003 Å |
| b |
9.7276 ± 0.0003 Å |
| c |
11.8768 ± 0.0004 Å |
| α |
105.505 ± 0.002° |
| β |
99.266 ± 0.001° |
| γ |
104.773 ± 0.001° |
| Cell volume |
963.17 ± 0.06 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0422 |
| Residual factor for significantly intense reflections |
0.0386 |
| Weighted residual factors for significantly intense reflections |
0.1023 |
| Weighted residual factors for all reflections included in the refinement |
0.1049 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.041 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4074004.html
