Information card for entry 4074003
| Formula |
C23 H25 Cl O5 Si |
| Calculated formula |
C23 H25 Cl O5 Si |
| SMILES |
c1(ccccc1)[Si](c1c(cc(cc1OC)OC)OC)(c1c(cccc1OC)OC)Cl |
| Title of publication |
The 2,4,6-Trimethoxyphenyl Unit as a Unique Protecting Group for Silicon in Synthesis and the Silylation Potential of (2,4,6-Trimethoxyphenyl)silanes |
| Authors of publication |
Popp, Friedrich; Nätscher, Jennifer B.; Daiss, Jürgen O.; Burschka, Christian; Tacke, Reinhold |
| Journal of publication |
Organometallics |
| Year of publication |
2007 |
| Journal volume |
26 |
| Journal issue |
24 |
| Pages of publication |
6014 |
| a |
8.5002 ± 0.0017 Å |
| b |
11.474 ± 0.002 Å |
| c |
11.703 ± 0.002 Å |
| α |
83.47 ± 0.03° |
| β |
85.03 ± 0.03° |
| γ |
74.21 ± 0.03° |
| Cell volume |
1089.4 ± 0.4 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0527 |
| Residual factor for significantly intense reflections |
0.0406 |
| Weighted residual factors for significantly intense reflections |
0.1 |
| Weighted residual factors for all reflections included in the refinement |
0.1048 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.043 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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