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Information card for entry 4077700
Preview
Coordinates | 4077700.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C48 H50 Si2 |
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Calculated formula | C48 H50 Si2 |
SMILES | [Si@@]1([Si@]2(C)c3cc(cc(c3c3cccc(c23)c2c(cc(cc2C)C)C)C)C)(C)c2cc(cc(c2c2cccc(c12)c1c(cc(cc1C)C)C)C)C.[Si@]1([Si@@]2(C)c3cc(cc(c3c3cccc(c23)c2c(cc(cc2C)C)C)C)C)(C)c2cc(cc(c2c2cccc(c12)c1c(cc(cc1C)C)C)C)C |
Title of publication | Reduction of Terphenyltrifluorosilanes: C−C Insertion Products and Possible Formation of a Disilyne |
Authors of publication | Pietschnig, Rudolf; West, Robert; Powell, Douglas R. |
Journal of publication | Organometallics |
Year of publication | 2000 |
Journal volume | 19 |
Journal issue | 14 |
Pages of publication | 2724 |
a | 8.8406 ± 0.0018 Å |
b | 11.157 ± 0.002 Å |
c | 21.144 ± 0.004 Å |
α | 88.282 ± 0.005° |
β | 82.74 ± 0.003° |
γ | 71.166 ± 0.003° |
Cell volume | 1957.9 ± 0.6 Å3 |
Cell temperature | 143 ± 2 K |
Ambient diffraction temperature | 143 ± 2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.2757 |
Residual factor for significantly intense reflections | 0.1186 |
Weighted residual factors for significantly intense reflections | 0.2471 |
Weighted residual factors for all reflections included in the refinement | 0.3053 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.897 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4077700.html
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Users of the data should acknowledge the original authors of the
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