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Information card for entry 4083102
Preview
Coordinates | 4083102.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C45 H36 F24 O9 Si2 |
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Calculated formula | C45 H36 F24 O9 Si2 |
SMILES | [Si]12([Si]34([OH]C(c5c3cccc5)(C(F)(F)F)C(F)(F)F)OC(c3c4cccc3)(C(F)(F)F)C(F)(F)F)([OH]C(c3c1cccc3)(C(F)(F)F)C(F)(F)F)OC(c1c2cccc1)(C(F)(F)F)C(F)(F)F.CC(=O)C.CC(=O)C.CC(=O)C.O.O |
Title of publication | Synthesis and Isolation of a Silylsilicate Containing Two Pentacoordinated Silicon Atoms by Monoprotonation of a Disilicate and Monodeprotonation of a Disilane |
Authors of publication | Kano, Naokazu; Sasaki, Keishi; Miyake, Hideaki; Kawashima, Takayuki |
Journal of publication | Organometallics |
Year of publication | 2014 |
Journal volume | 33 |
Journal issue | 9 |
Pages of publication | 2358 |
a | 39.272 ± 0.014 Å |
b | 28.384 ± 0.009 Å |
c | 36.443 ± 0.012 Å |
α | 90° |
β | 90° |
γ | 90° |
Cell volume | 40623 ± 2 Å3 |
Cell temperature | 120 ± 2 K |
Ambient diffraction temperature | 120 ± 2 K |
Number of distinct elements | 5 |
Space group number | 43 |
Hermann-Mauguin space group symbol | F d d 2 |
Hall space group symbol | F 2 -2d |
Residual factor for all reflections | 0.0968 |
Residual factor for significantly intense reflections | 0.0658 |
Weighted residual factors for significantly intense reflections | 0.1464 |
Weighted residual factors for all reflections included in the refinement | 0.166 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.992 |
Diffraction radiation wavelength | 0.7107 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4083102.html
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Users of the data should acknowledge the original authors of the
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