Information card for entry 4084049

Structure parameters

• Formula: C44 H77 Cl N2 P2 Ru Si
• Calculated formula: C44 H77 Cl N2 P2 Ru Si
• SMILES: [Ru]12(=[Si]3N(C=CN3C(C)(C)C)C(C)(C)C)(Cl)[P](C3CCCCC3)(C3CCCCC3)CC2CC[P]1(C1CCCCC1)C1CCCCC1.c1ccccc1
• Title of publication: A Stable Silylene in a Reactive Environment: Synthesis, Reactivity, and Silicon Extrusion Chemistry of a Coordinatively Unsaturated Ruthenium Silylene Complex Containing Chloride and η3-P‒C‒P Ligands
• Authors of publication: Amoroso, Dino; Haaf, Michael; Yap, Glenn P. A.; West, Robert; Fogg, Deryn E.
• Journal of publication: Organometallics
• Year of publication: 2002
• Journal volume: 21
• Journal issue: 3
• Pages of publication: 534 - 540
• a: 13.503 ± 0.001 Å
• b: 17.697 ± 0.002 Å
• c: 20.11 ± 0.002 Å
• α: 90°
• β: 105.742 ± 0.002°
• γ: 90°
• Cell volume: 4625.3 ± 0.8 ų
• Cell temperature: 203 ± 2 K
• Ambient diffraction temperature: 203 ± 2 K
• Number of distinct elements: 7
• Space group number: 7
• Hermann-Mauguin space group symbol: P 1 c 1
• Hall space group symbol: P -2yc
• Residual factor for all reflections: 0.0513
• Residual factor for significantly intense reflections: 0.0388
• Weighted residual factors for significantly intense reflections: 0.0819
• Weighted residual factors for all reflections included in the refinement: 0.0843
• Goodness-of-fit parameter for all reflections included in the refinement: 1.021
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No