Information card for entry 4084050

Structure parameters

• Formula: C62 H109 Cl3 N2 P4 Ru2
• Calculated formula: C62 H108 Cl3 N2 P4 Ru2
• SMILES: [Ru]123([Cl][Ru]4([Cl]1)([Cl]2)[P](C1CCCCC1)(C1CCCCC1)CCCC[P]4(C1CCCCC1)C1CCCCC1)([N]#N)[P](C1CCCCC1)(C1CCCCC1)CCCC[P]3(C1CCCCC1)C1CCCCC1.c1ccccc1
• Title of publication: A Stable Silylene in a Reactive Environment: Synthesis, Reactivity, and Silicon Extrusion Chemistry of a Coordinatively Unsaturated Ruthenium Silylene Complex Containing Chloride and η3-P‒C‒P Ligands
• Authors of publication: Amoroso, Dino; Haaf, Michael; Yap, Glenn P. A.; West, Robert; Fogg, Deryn E.
• Journal of publication: Organometallics
• Year of publication: 2002
• Journal volume: 21
• Journal issue: 3
• Pages of publication: 534 - 540
• a: 11.622 ± 0.0009 Å
• b: 13.5699 ± 0.001 Å
• c: 22.7781 ± 0.0017 Å
• α: 89.723 ± 0.001°
• β: 86.837 ± 0.001°
• γ: 66.508 ± 0.001°
• Cell volume: 3289 ± 0.4 ų
• Cell temperature: 203 ± 2 K
• Ambient diffraction temperature: 203 ± 2 K
• Number of distinct elements: 6
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.0971
• Residual factor for significantly intense reflections: 0.0487
• Weighted residual factors for significantly intense reflections: 0.0964
• Weighted residual factors for all reflections included in the refinement: 0.1059
• Goodness-of-fit parameter for all reflections included in the refinement: 1.028
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No