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Information card for entry 4087969
Preview
| Coordinates | 4087969.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | cyclo-(t-Bu2SnOMe2SiCH2)2 |
|---|---|
| Formula | C22 H52 O2 Si2 Sn2 |
| Calculated formula | C22 H52 O2 Si2 Sn2 |
| SMILES | O1[Sn](C(C)(C)C)(C[Si](C)(C)O[Sn](C[Si]1(C)C)(C(C)(C)C)C(C)(C)C)C(C)(C)C |
| Title of publication | cyclo-Stannasiloxanes Containing both Oxygen Atoms and Methylene Moieties within the Ring and Formation of Related Organotin Oxo Clusters |
| Authors of publication | Baba Haj, Samer; Dietz, Christina; Lutter, Michael; Jurkschat, Klaus |
| Journal of publication | Organometallics |
| Year of publication | 2015 |
| Journal volume | 34 |
| Journal issue | 23 |
| Pages of publication | 5555 |
| a | 8.8934 ± 0.0004 Å |
| b | 9.1366 ± 0.0004 Å |
| c | 10.8755 ± 0.0005 Å |
| α | 77.908 ± 0.004° |
| β | 75.147 ± 0.004° |
| γ | 61.593 ± 0.005° |
| Cell volume | 747.32 ± 0.07 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0171 |
| Residual factor for significantly intense reflections | 0.0162 |
| Weighted residual factors for significantly intense reflections | 0.046 |
| Weighted residual factors for all reflections included in the refinement | 0.0462 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.348 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4087969.html
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Users of the data should acknowledge the original authors of the
structural data.