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Information card for entry 4087970
Preview
| Coordinates | 4087970.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | cyclo-[{Me2N(CH2)3}PhSnOMe2SiCH2]2 |
|---|---|
| Formula | C28 H50 N2 O2 Si2 Sn2 |
| Calculated formula | C28 H50 N2 O2 Si2 Sn2 |
| SMILES | C1[Si](C)(C)O[Sn@@](CCCN(C)C)(c2ccccc2)C[Si](C)(C)O[Sn@]1(CCCN(C)C)c1ccccc1 |
| Title of publication | cyclo-Stannasiloxanes Containing both Oxygen Atoms and Methylene Moieties within the Ring and Formation of Related Organotin Oxo Clusters |
| Authors of publication | Baba Haj, Samer; Dietz, Christina; Lutter, Michael; Jurkschat, Klaus |
| Journal of publication | Organometallics |
| Year of publication | 2015 |
| Journal volume | 34 |
| Journal issue | 23 |
| Pages of publication | 5555 |
| a | 8.5925 ± 0.0011 Å |
| b | 9.037 ± 0.0007 Å |
| c | 11.0256 ± 0.0015 Å |
| α | 93.036 ± 0.009° |
| β | 97.894 ± 0.011° |
| γ | 102.579 ± 0.009° |
| Cell volume | 824.63 ± 0.17 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0382 |
| Residual factor for significantly intense reflections | 0.0327 |
| Weighted residual factors for significantly intense reflections | 0.087 |
| Weighted residual factors for all reflections included in the refinement | 0.0911 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.111 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4087970.html
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Users of the data should acknowledge the original authors of the
structural data.