Information card for entry 4101605
| Formula |
C20 H8 S2 |
| Calculated formula |
C20 H8 S2 |
| SMILES |
S1c2ccc3ccc4c5c3c2c2c3c(ccc(c53)S4)ccc12 |
| Title of publication |
Solution-Processed, High-Performance Nanoribbon Transistors Based on Dithioperylene |
| Authors of publication |
Jiang, Wei; Zhou, Yan; Geng, Hua; Jiang, Shidong; Yan, Shouke; Hu, Wenping; Wang, Zhaohui; Shuai, Zhigang; Pei, Jian |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2011 |
| Journal volume |
133 |
| Journal issue |
1 |
| Pages of publication |
1 - 3 |
| a |
9.6585 ± 0.0019 Å |
| b |
4.3731 ± 0.0009 Å |
| c |
15.436 ± 0.003 Å |
| α |
90° |
| β |
98.37 ± 0.03° |
| γ |
90° |
| Cell volume |
645 ± 0.2 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.064 |
| Residual factor for significantly intense reflections |
0.0564 |
| Weighted residual factors for significantly intense reflections |
0.146 |
| Weighted residual factors for all reflections included in the refinement |
0.1523 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.126 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4101605.html