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Information card for entry 4102171
Preview
| Coordinates | 4102171.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C28 H32 Si2 Ti |
|---|---|
| Calculated formula | C28 H32 Si2 Ti |
| SMILES | C1(=C([Si](C)(c2ccccc2)c2ccccc2)[Ti]234567891([cH]1[cH]2[cH]3[cH]4[cH]51)[cH]1[cH]6[cH]7[cH]8[cH]91)[Si](C)(C)C |
| Title of publication | Si-H Bond Activation of Alkynylsilanes by Group 4 Metallocene Complexes |
| Authors of publication | Martin Lamač; Anke Spannenberg; Wolfgang Baumann; Haijun Jiao; Christine Fischer; Sven Hansen; Perdita Arndt; Uwe Rosenthal |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2010 |
| Journal volume | 132 |
| Pages of publication | 4369 - 4380 |
| a | 8.5394 ± 0.0004 Å |
| b | 10.3251 ± 0.0005 Å |
| c | 16.5699 ± 0.0008 Å |
| α | 94.324 ± 0.004° |
| β | 101.046 ± 0.003° |
| γ | 114.318 ± 0.003° |
| Cell volume | 1287.09 ± 0.11 Å3 |
| Cell temperature | 200 ± 2 K |
| Ambient diffraction temperature | 200 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0535 |
| Residual factor for significantly intense reflections | 0.0322 |
| Weighted residual factors for significantly intense reflections | 0.0722 |
| Weighted residual factors for all reflections included in the refinement | 0.0757 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.86 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4102171.html
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Users of the data should acknowledge the original authors of the
structural data.