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Information card for entry 4104317
Preview
Coordinates | 4104317.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C32 H12 F14 N2 O4 |
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Calculated formula | C32 H12 F14 N2 O4 |
SMILES | C1(=O)c2ccc3c4c2c(C(=O)N1CC(F)(F)C(F)(F)C(F)(F)F)ccc4c1ccc2C(=O)N(C(=O)c4c2c1c3cc4)CC(F)(F)C(F)(F)C(F)(F)F |
Title of publication | High-Performance Air-Stable n-Channel Organic Thin Film Transistors Based on Halogenated Perylene Bisimide Semiconductors |
Authors of publication | Rüdiger Schmidt; Joon Hak Oh; Ya-Sen Sun; Manuela Deppisch; Ana-Maria Krause; Krzysztof Radacki; Holger Braunschweig; Martin Könemann; Peter Erk; Zhenan Bao; Frank Würthner |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2009 |
Journal volume | 131 |
Pages of publication | 6215 - 6228 |
a | 4.9104 ± 0.0004 Å |
b | 8.4835 ± 0.0007 Å |
c | 16.2891 ± 0.0013 Å |
α | 97.489 ± 0.004° |
β | 94.373 ± 0.004° |
γ | 98.033 ± 0.004° |
Cell volume | 663.08 ± 0.09 Å3 |
Cell temperature | 100 ± 2 K |
Ambient diffraction temperature | 100 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0463 |
Residual factor for significantly intense reflections | 0.0352 |
Weighted residual factors for significantly intense reflections | 0.0935 |
Weighted residual factors for all reflections included in the refinement | 0.0995 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.057 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4104317.html
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Users of the data should acknowledge the original authors of the
structural data.