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Information card for entry 4104646
Preview
Coordinates | 4104646.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C21 H34 O4 S Si |
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Calculated formula | C21 H34 O4 S Si |
SMILES | S(=O)(=O)(C1=C[C@@H](O)[C@@H]([C@@H](O[Si](C(C)(C)C)(C)C)C[C@@H]1C)C)c1ccccc1.S(=O)(=O)(C1=C[C@H](O)[C@H]([C@H](O[Si](C(C)(C)C)(C)C)C[C@H]1C)C)c1ccccc1 |
Title of publication | Reagent-Directed Allylic Quadraselection. Chemoselective Anti- and Syn-Lawton SN2' Methylation of Seven-Membered Epoxyvinylsulfones |
Authors of publication | Wan Pyo Hong; Ahmad El-Awa; Philip L. Fuchs |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2009 |
Journal volume | 131 |
Pages of publication | 9150 - 9151 |
a | 7.8455 ± 0.0007 Å |
b | 12.3519 ± 0.001 Å |
c | 12.7612 ± 0.0012 Å |
α | 102.975 ± 0.004° |
β | 90.66 ± 0.005° |
γ | 106.971 ± 0.004° |
Cell volume | 1148.65 ± 0.18 Å3 |
Cell temperature | 150 K |
Ambient diffraction temperature | 150 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.08 |
Residual factor for significantly intense reflections | 0.046 |
Weighted residual factors for significantly intense reflections | 0.108 |
Weighted residual factors for all reflections included in the refinement | 0.119 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.034 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MO-Kα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4104646.html
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