Information card for entry 4106970

Structure parameters

• Formula: C71 H71 B N2 P3 Ru Si
• Calculated formula: C71 H71 B N2 P3 Ru Si
• Title of publication: High Electrophilicity at Silicon in η3-Silane σ-Complexes: Lewis Base Adducts of a Silane Ligand, Featuring Octahedral Silicon and Three Ru-H-Si Interactions
• Authors of publication: Mark C. Lipke; T. Don Tilley
• Journal of publication: Journal of the American Chemical Society
• Year of publication: 2011
• Journal volume: 133
• Pages of publication: 16374 - 16377
• a: 13.4177 ± 0.0016 Å
• b: 24.646 ± 0.003 Å
• c: 20.125 ± 0.002 Å
• α: 90°
• β: 95.752 ± 0.003°
• γ: 90°
• Cell volume: 6621.7 ± 1.3 ų
• Cell temperature: 158 ± 2 K
• Ambient diffraction temperature: 158 ± 2 K
• Number of distinct elements: 7
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0454
• Residual factor for significantly intense reflections: 0.0409
• Weighted residual factors for significantly intense reflections: 0.0976
• Weighted residual factors for all reflections included in the refinement: 0.0998
• Goodness-of-fit parameter for all reflections included in the refinement: 1.135
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: Yes
• Has Fobs: No