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Information card for entry 4127811
Preview
Coordinates | 4127811.cif |
---|---|
Original paper (by DOI) | HTML |
Chemical name | 5,9,14,18-tetrahexyl-7,16-bis(triisopropylethynyl)bisnaphtho[2',3':3,4]cyclobut[1,2-b:1',2'-i]anthracene |
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Formula | C80 H106 Si2 |
Calculated formula | C80 H106 Si2 |
SMILES | C(C)(C)[Si](C(C)C)(C(C)C)C#Cc1c2cc3c4c(c(c5c(c4CCCCCC)cccc5)CCCCCC)c3cc2c(C#C[Si](C(C)C)(C(C)C)C(C)C)c2cc3c4c(c5ccccc5c(c4c3cc12)CCCCCC)CCCCCC |
Title of publication | Crystal Engineering of Biphenylene-Containing Acenes for High-Mobility Organic Semiconductors. |
Authors of publication | Wang, Jinlian; Chu, Ming; Fan, Jian-Xun; Lau, Tsz-Ki; Ren, Ai-Min; Lu, Xinhui; Miao, Qian |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2019 |
Journal volume | 141 |
Journal issue | 8 |
Pages of publication | 3589 - 3596 |
a | 11.9595 ± 0.0007 Å |
b | 12.1909 ± 0.0007 Å |
c | 13.5416 ± 0.0008 Å |
α | 83.5564 ± 0.0015° |
β | 78.4471 ± 0.0015° |
γ | 64.2983 ± 0.0014° |
Cell volume | 1742.23 ± 0.18 Å3 |
Cell temperature | 298 ± 2 K |
Ambient diffraction temperature | 298 ± 2 K |
Number of distinct elements | 3 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1517 |
Residual factor for significantly intense reflections | 0.094 |
Weighted residual factors for significantly intense reflections | 0.2228 |
Weighted residual factors for all reflections included in the refinement | 0.2566 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.07 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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