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Information card for entry 4133582
Preview
Coordinates | 4133582.cif |
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Original paper (by DOI) | HTML |
Formula | C55 H64 N4 O Si2 |
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Calculated formula | C55 H64 N4 O Si2 |
SMILES | [Si]12([Si]3(OC2(c2ccccc2)c2ccccc2)([N](=C(N3C(C)(C)C)c2ccccc2)C(C)(C)C)c2c3c1ccc1c3c(cc2)CC1)N(C(=N\C(C)(C)C)\c1ccccc1)C(C)(C)C |
Title of publication | Geometrically Compelled Disilene with λ<sup>4</sup>-Coordinate Si<sup>II</sup> Atoms. |
Authors of publication | Kostenko, Arseni; Driess, Matthias |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2018 |
Journal volume | 140 |
Journal issue | 49 |
Pages of publication | 16962 - 16966 |
a | 12.6253 ± 0.0004 Å |
b | 12.9455 ± 0.0005 Å |
c | 16.4249 ± 0.0005 Å |
α | 83.107 ± 0.003° |
β | 84.228 ± 0.003° |
γ | 66.911 ± 0.003° |
Cell volume | 2447.4 ± 0.15 Å3 |
Cell temperature | 150 ± 0.1 K |
Ambient diffraction temperature | 150 ± 0.1 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.0454 |
Residual factor for significantly intense reflections | 0.0374 |
Weighted residual factors for significantly intense reflections | 0.096 |
Weighted residual factors for all reflections included in the refinement | 0.1021 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.03 |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4133582.html
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