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Information card for entry 4133628
Preview
Coordinates | 4133628.cif |
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Original paper (by DOI) | HTML |
Formula | C69 H90 N6 O Si2 |
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Calculated formula | C69 H90 N6 O Si2 |
SMILES | [Si]123([N](=C(N1C(C)(C)C)c1ccccc1)C(C)(C)C)c1c4Oc5c([Si](N(/C(=N/C(C)(C)C)c6ccccc6)C(C)(C)C)(C\2=N/c2c(C)cccc2C)C\3=N/c2c(cccc2C)C)cccc5C(c4ccc1)(C)C.CCCCCC |
Title of publication | Silicon-Mediated Selective Homo- and Heterocoupling of Carbon Monoxide. |
Authors of publication | Wang, Yuwen; Kostenko, Arseni; Hadlington, Terrance J.; Luecke, Marcel-Philip; Yao, Shenglai; Driess, Matthias |
Journal of publication | Journal of the American Chemical Society |
Year of publication | 2019 |
Journal volume | 141 |
Journal issue | 1 |
Pages of publication | 626 - 634 |
a | 12.8721 ± 0.0006 Å |
b | 13.2729 ± 0.0007 Å |
c | 20.801 ± 0.0009 Å |
α | 102.478 ± 0.004° |
β | 90.872 ± 0.004° |
γ | 116.307 ± 0.005° |
Cell volume | 3085.4 ± 0.3 Å3 |
Cell temperature | 150 ± 2 K |
Ambient diffraction temperature | 150 ± 2 K |
Number of distinct elements | 5 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1502 |
Residual factor for significantly intense reflections | 0.0887 |
Weighted residual factors for significantly intense reflections | 0.2135 |
Weighted residual factors for all reflections included in the refinement | 0.2769 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.986 |
Diffraction radiation wavelength | 1.54184 Å |
Diffraction radiation type | CuKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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The link is: https://www.crystallography.net/4133628.html
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Users of the data should acknowledge the original authors of the
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