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Information card for entry 4323908
Preview
| Coordinates | 4323908.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C51 H51 Mo O6 P3 |
|---|---|
| Calculated formula | C51 H51 Mo O6 P3 |
| SMILES | [Mo]12([P](C3(CC([P]2(c2ccccc2)c2ccccc2)(CC([P]1(c1ccccc1)c1ccccc1)(C3)COC)COC)COC)(c1ccccc1)c1ccccc1)(C#[O])(C#[O])C#[O] |
| Title of publication | The Mo(CO)3 Fragment as an Organometallic Protection Group in the Synthesis of Functionalized Tripodal Phosphine Ligands |
| Authors of publication | Philipp Stössel; Hermann A. Mayer; Cäcilia Maichle-Mössmer; Riad Fawzi; Manfred Steimann |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 1996 |
| Journal volume | 35 |
| Pages of publication | 5860 - 5867 |
| a | 11.705 ± 0.005 Å |
| b | 16.941 ± 0.009 Å |
| c | 22.526 ± 0.009 Å |
| α | 90° |
| β | 96.51 ± 0.03° |
| γ | 90° |
| Cell volume | 4438 ± 4 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0789 |
| Residual factor for significantly intense reflections | 0.054 |
| Weighted residual factors for all reflections | 0.1599 |
| Weighted residual factors for significantly intense reflections | 0.1375 |
| Goodness-of-fit parameter for all reflections | 1.544 |
| Goodness-of-fit parameter for significantly intense reflections | 1.612 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4323908.html
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