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Information card for entry 4335749
Preview
Coordinates | 4335749.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C84 H87 Ge3 N3 P6 Si3 |
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Calculated formula | C84 H87 Ge3 N3 P6 Si3 |
SMILES | [Ge]12[Ge]34[P](C(=[Ge]([P](C=3P(=[N]1[Si](C)(C)C)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1)[P](C=4P(=[N]2[Si](C)(C)C)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1)P(=N[Si](C)(C)C)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1 |
Title of publication | Synthesis and Structural Characterization of Base-Stabilized Oligomeric Heterovinylidenes |
Authors of publication | Wing-Por Leung; Wang-Kin Chiu; Thomas C. W. Mak |
Journal of publication | Inorganic Chemistry |
Year of publication | 2013 |
Journal volume | 52 |
Pages of publication | 9479 - 9486 |
a | 16.6973 ± 0.0008 Å |
b | 22.798 ± 0.0011 Å |
c | 23.5002 ± 0.0012 Å |
α | 86.208 ± 0.001° |
β | 78.449 ± 0.001° |
γ | 89.751 ± 0.001° |
Cell volume | 8745 ± 0.7 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 6 |
Space group number | 2 |
Hermann-Mauguin space group symbol | P -1 |
Hall space group symbol | -P 1 |
Residual factor for all reflections | 0.1097 |
Residual factor for significantly intense reflections | 0.0608 |
Weighted residual factors for significantly intense reflections | 0.1453 |
Weighted residual factors for all reflections included in the refinement | 0.1623 |
Goodness-of-fit parameter for all reflections included in the refinement | 0.899 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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