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Information card for entry 4335750
Preview
Coordinates | 4335750.cif |
---|---|
Original paper (by DOI) | HTML |
Formula | C56 H58 N2 P4 Si2 Sn2 |
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Calculated formula | C56 H58 N2 P4 Si2 Sn2 |
SMILES | C[Si](C)(C)N1[Sn]2[C]3(P(c4ccccc4)c4ccccc4)=P(N([Si](C)(C)C)[Sn]3[C]2(=P1(c1ccccc1)c1ccccc1)P(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1 |
Title of publication | Synthesis and Structural Characterization of Base-Stabilized Oligomeric Heterovinylidenes |
Authors of publication | Wing-Por Leung; Wang-Kin Chiu; Thomas C. W. Mak |
Journal of publication | Inorganic Chemistry |
Year of publication | 2013 |
Journal volume | 52 |
Pages of publication | 9479 - 9486 |
a | 10.408 ± 0.0003 Å |
b | 12.8655 ± 0.0004 Å |
c | 20.8788 ± 0.0007 Å |
α | 90° |
β | 101.642 ± 0.001° |
γ | 90° |
Cell volume | 2738.24 ± 0.15 Å3 |
Cell temperature | 296 ± 2 K |
Ambient diffraction temperature | 296 ± 2 K |
Number of distinct elements | 6 |
Space group number | 14 |
Hermann-Mauguin space group symbol | P 1 21/c 1 |
Hall space group symbol | -P 2ybc |
Residual factor for all reflections | 0.0439 |
Residual factor for significantly intense reflections | 0.0275 |
Weighted residual factors for significantly intense reflections | 0.0613 |
Weighted residual factors for all reflections included in the refinement | 0.0687 |
Goodness-of-fit parameter for all reflections included in the refinement | 1.023 |
Diffraction radiation wavelength | 0.71073 Å |
Diffraction radiation type | MoKα |
Has coordinates | Yes |
Has disorder | No |
Has Fobs | No |
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